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		<identifier>J8LNKAN8RW/3D4TQ7S</identifier>
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		<doi>10.4028/www.scientific.net/MSF.727-728.1433</doi>
		<issn>0255-5476</issn>
		<label>lattes: 5450987692265022 2 CamposCoTrMoBaCo:2012:CVDiFi</label>
		<citationkey>CamposCoTrMoBaCo:2012:CVDiFi</citationkey>
		<title>CVD Diamond Films Growth on Silicon Nitride Inserts (Si<sub>3</sub>N<sub>4</sub>) with High Nucleation Density by Functionalization Seeding</title>
		<year>2012</year>
		<secondarytype>PRE PI</secondarytype>
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		<size>631 KiB</size>
		<author>Campos, Raonei Alves,</author>
		<author>Contin, Andre,</author>
		<author>Trava-Airoldi, Vladimir J.,</author>
		<author>Moro, J. R.,</author>
		<author>Barquete, D. M.,</author>
		<author>Corat, Evaldo J.,</author>
		<group>LAS-CTE-INPE-MCTI-GOV-BR</group>
		<group>LAS-CTE-INPE-MCTI-GOV-BR</group>
		<group>LAS-CTE-INPE-MCTI-GOV-BR</group>
		<group></group>
		<group></group>
		<group>LAS-CTE-INPE-MCTI-GOV-BR</group>
		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<affiliation>IFSP, Instituto Federal de Educação, Ciência e Tecnologia de São Paulo, CEP 12929-600 Bragança Paulista, SP, Brazil</affiliation>
		<affiliation>UESC, Universidade Estadual de Santa Cruz, Rodovia Ilhéus-Itabuna, CEP 45662-900, Ilhéus, BA, Brazil</affiliation>
		<affiliation>Instituto Nacional de Pesquisas Espaciais (INPE)</affiliation>
		<electronicmailaddress>campos@las.inpe.br</electronicmailaddress>
		<electronicmailaddress>andrecontin@yahoo.com.br</electronicmailaddress>
		<e-mailaddress>andrecontin@yahoo.com.br</e-mailaddress>
		<journal>Materials Science Forum. Advanced Powder Technology VIII Book Series</journal>
		<volume>727-728</volume>
		<pages>1433-1438</pages>
		<secondarymark>C_ASTRONOMIA_/_FÍSICA B5_ECOLOGIA_E_MEIO_AMBIENTE B1_ENGENHARIAS_I B2_ENGENHARIAS_II B5_ENGENHARIAS_III B1_INTERDISCIPLINAR B2_MATERIAIS B5_MEDICINA_I B3_MEDICINA_II B1_ODONTOLOGIA C_QUÍMICA</secondarymark>
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		<contenttype>External Contribution</contenttype>
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		<keywords>CVD diamond, HFCVD, Silicon nitride (Si 3N 4).</keywords>
		<abstract>Silicon Nitride is largely used as the base material to manufacture cutting tools. Due to its low thermal expansion coefficient it is ideal candidate for CVD diamond deposition. In this work, we functionalized the surface of silicon nitride inserts (Si 3N 4) with a polymer (PDDA - Poly (diallyldimethylamonium chloride - Mw 40000)) to promote seeding with nanodiamond particles. The seeding was performed in water slurry containing 4 nm diamond particles dispersed by PSS - Poly (sodium4-styrenesulfonate) polymer. CVD diamond films, with high nucleation density, were deposited in a hot filament reactor. Film morphology was characterized by Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). Diamond film quality was determined by Raman Spectroscopy. CVD diamond film adherence was evaluated using Rockwell C indentation.</abstract>
		<area>FISMAT</area>
		<language>pt</language>
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